Abstract: In advanced optical lithography, it is critical to obtain a mask with high fidelity to a target pattern and strong tolerance to process variation within a short time. This article formulates ...

Abstract: In the context of the large-scale deployment of 5G base stations, atmospheric ducts cause remote interference in time division duplex systems. Addressing the impact of remote interference on ...

A monthly overview of things you need to know as an architect or aspiring architect. Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with ...