AMSTERDAM, Dec 21 (Reuters) - Dutch semiconductor equipment maker ASML ASML.AS said on Thursday it is shipping the first of its new "High NA" extreme ultraviolet lithography systems to Intel INTC.O ...

Add Yahoo as a preferred source to see more of our stories on Google. A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by ...

Extreme Ultraviolet (EUV) lithography represents a transformative advancement in semiconductor fabrication, utilising 13.5‐nm wavelength light to achieve remarkably fine feature sizes far below the 10 ...

New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...

Intel (NASDAQ:INTC) said it has assembled the industry's first High Numerical Aperture Extreme Ultraviolet lithography system developed by ASML (ASML), following decades of collaboration with the ...

The recent unveiling of a new local deep ultraviolet (DUV) lithography machine model by China's Ministry of Industry and Information Technology (MIIT) has become a hot topic of discussion online in ...

TSMC and ASML have announced a key milestone in extreme ultraviolet lithography (EUV) tech this week at the 2015 SPIE conference (SPIE is an international professional society for photonics and optics ...

SK Hynix announced that it has successfully assembled the industry's first high-NA extreme ultraviolet (EUV) lithography system for mass production at its M16 fabrication plant in Icheon, South Korea.