The semiconductor industry, constrained by the protracted delay in the introduction of next-generation lithography, has had to extend optical lithography below the 100-nanometer node by adopting ...
SAN JOSE – KLA-Tencor Inc. has introduced a new product that identifies reticle design errors by inspecting the wafer in the IC production process. The product enbles chip makers to qualify the ...
May 22, 2014. KLA-Tencor has announced the Teron SL650, a new reticle quality-control solution for IC fabs that supports 20-nm design nodes and beyond. With 193-nm illumination and multiple STARlight ...
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